A novel approach for efficient XUV generation

Congratulations to Caterina Vozzi, Research Director at Consiglio Nazionale delle Ricerche (CNR), Institute for Photonics and Nanotechnologies, and co-worker for the freshly published results on a novel approach for laser-driven XUV and soft-x-ray sources through High Harmonic generation.

Article “Microfluidic devices for quasi-phase-matching in high-order harmonic generation” published on 16 November 2022

Amplitude Laser is proud to contribute to this achievement with its laser technology and continues supporting this group throughout the year with its service team. In this regard, we address a special thanks to Phillippe Demengeot, Customer Service for Grand Project at Amplitude.


>> What is this novel approach ?

The novel approach consists of the use of a microfluidic glass device, micromachined by an ultrafast laser (Satsuma model), and filled with gas. Ultrashort, high-intensity laser pulses (ARCO product range) propagate in the microfluidic device and interact with the gas, resulting in a high harmonic generation.


>> Why choosing Amplitude and its laser solutions?

« Our research activity relies on femtosecond laser sources. For instance, we need ultrashort pulses to develop novel approaches in attosecond science, ultrafast spectroscopy, and microfabrication by femtosecond laser micromachining. One of our current activities focuses on the miniaturization of complex XUV sources, one of the current challenges in Photonics. In this work, we trace a route toward a bright and flexible XUV source based on high-order harmonic generation inside integrated microfluidic devices.” explains Catarina Vozzi

Anna GOLINELLI, Sales Manager at Amplitude says “It is exciting to witness how different laser technologies provided by Amplitude can work together and support such great scientific achievement. Two laser systems have been chosen for this work” 👇

> TiSa, mJ level, femtosecond laser system (ARCO), named Aurora, was used for High Harmonic Generation. This process is triggered by the interaction between a high-peak intensity laser pulse with gas. Ultrashort pulse duration (fs) with mJ level energy fulfills the requirements for HHG. The experiment could also benefit from the kHz repetition rate, for decreasing the acquisition time.

> Satsuma ultrafast laser was used for manufacturing the microfluidic gas device, operating the FLICE technique. This technique requires irradiating a fused silica substrate with a high repetition rate of femtosecond pulses. When a high amount of energy is deposited inside a targeted area in the volume, a permanent modification of the material is induced, and local etching is possible. Satsuma, with up to MHz repetition rate, and hundreds of femtosecond pulse duration is a reliable and stable laser for µmachining.

This novel approach for laser-driven XUV and soft-x-ray sources has seen the light thanks to

  • Udyni (Ultrafast dynamics in matter | Udyni), lead by Vozzi (CNR) and Stagira (Politecnico) working on HHG and owning the femtosecond laser system (ARCO), named Aurora
  • FAST (Femtosecond Laser Micromachining – IFN Milano (cnr.it) lead by Osellame (CNR) that worked on the microfluidic device fabrication with Satsuma