Photoelectron generation

Modern accelerators use photoinjectors to generate electrons that will be subsequently accelerated by RF LINAC accelerators. Ultrafast electron microscopes also rely on photocathodes to generate electrons. These electrons are generated through the photoelectric effect of a UV photon on a metallic surface (Copper) or a semiconductor (CsTe).

Laser Requirements and Synchronization

The required charge, bunch duration, repetition rate and quantum efficiency drive the need for the dedicated laser to be chosen among TiSa or Ytterbium laser technology.
TiSa or OPCPA technology allows us to achieve broadband or tunable pulses for ultimate temporal shaping of UV pulses.

Ytterbium lasers allow for providing high-energy UV pulses for high electron charge at 100Hz to kHz repetition rate, or high current at MHz repetition rate.

The coherence of the electron bunches can also be subsequently reduced by using a secondary laser beam.

In all cases, precise timing synchronization is required to ensure that the electrons produced are well synchronized with the rest of the machine, especially with the RF accelerating sections.

Amplitude developed a dedicated portfolio allowing not only to synchronize the oscillator to the RF or optical reference, but also to ensure that the laser ultrafast amplifiers maintain this timing precision.

Key Components and Processes

Photoinjectors and photocathodes generate electron bunches using the photoelectric effect, where a UV photon releases electrons from a metallic (Copper) or semiconductor (CsTe) surface.
Depending on the required charge, pulse duration, repetition rate, and quantum efficiency, the laser choice varies:

  • Ti:Sapphire (TiSa) or OPCPA : broadband/tunable UV pulses for advanced temporal shaping.
  • Ytterbium lasers : high-energy UV pulses, enabling either high electron charge (100 Hz–kHz) or high current (MHz). Precise timing synchronization with RF accelerators is essential to ensure stable operation.

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